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Quantitative Determination of Enhanced and Suppressed Transmission through Subwavelength Slit Arrays in Silver Films

机译:增强和抑制传输的定量测定   通过银膜中的亚波长狭缝阵列

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摘要

Measurement of the transmitted intensity from a coherent monomode lightsource through a series of subwavelength slit arrays in Ag films, with varyingarray pitch and number of slits, demonstrate enhancement (suppression) by asmuch as a factor of 6 (9) when normalized to that of an isolated slit.Pronounced minima in the transmitted intensity were observed at array pitchescorresponding to lambda_SPP, 2lambda_SPP, and 3lambda_SPP where lambda_SPP isthe wavelength of the surface plasmon polariton (SPP). Increasing the number ofslits to more than four does not increase appreciably the per-slit transmissionintensity. These results are consistent with a model for interference betweenSPPs and the incident wave that fits well the measured transmitted intensityprofile.
机译:从相干单模光源通过银膜中一系列亚波长狭缝阵列的透射强度的测量(具有不同的阵列节距和狭缝数量),在归一化为(6)的情况下,显示出的增强(抑制)系数高达6(9)。在对应于lambda_SPP,2lambda_SPP和3lambda_SPP的阵列间距处观察到透射强度的最低点,其中lambda_SPP是表面等离子体激元(SPP)的波长。将缝隙的数量增加到四个以上不会明显增加每缝隙的传输强度。这些结果与SPP和入射波之间的干扰模型非常吻合,该模型非常适合测得的透射强度分布。

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